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Its primary function involves refrigeration: ASML's extreme ultraviolet lithography systems, the exclusive equipment able to etch patterns under 7nm, produce intense heat during use. Helium's heat transfer properties and non-reactive nature render it the sole gas appropriate for cooling these devices without contamination hazards. Apart from EUV, helium-based cooling of silicon wafers during ion implantation can influence dopant positioning accuracy, even with minimal temperature fluctuations.